Research & Development Laboratory

 

 

 

 

 

 

• Established Research & Development Laboratory in 2012

• Converted corporate Research & Development Laboratory on December in 2012

 

 

 

• Research and development that meets the customer's requirements

• Secure technology that reflects the market situation in the rapidly changing

• Research and development that consistents with business strategy of the company

 

 

 Intellectual property status

 

 

patent application

patent disclosure

patent registeration

The domestic market

19ea

-

12ea

Overseas market

 2ea

 

2ea

 

 

 

Patentstatusregisteration numberCountry

Repair method of

Electrostatic Chuck

Registeration

10-1******

S.KOREA

Electrostatic Chuck

Registeration

10-1******

S.KOREA

Electrostatic Chuck 

Registeration 

10-1****** 

S.KOREA 

 Electrostatic Chuck & Its Repair Method

 Registeration

10-1****** 

 S.KOREA 

 Electrostatic Chuck & Its Repair Method

Registeration

10-1****** 

 S.KOREA  

 Electrostatic Chuck & Its Repair Method

Registeration

 10-1******  

 S.KOREA  

 Electrostatic Chuck & Its Repair Method

Registeration

 10-1******  

 S.KOREA  

 Repair method of Electrostatic Chuck

 Registeration

10-2****** 

S.KOREA 

Edge Ring of Electrostatic Chuck  

 Registeration

10-2****** 

S.KOREA 

 Electrostatic Chuck and Repair Method thereof

 Registeration

6***** 

 TAIWAN

 Electrostatic Chuck

Registeration

10-2****** 

S.KOREA 

 Electrostatic Chuck & Its Repair Method

Registeration 

10-2****** 

S.KOREA 

 Electrostatic Chuck Test Equipment

Registeration 

10-2****** 

S.KOREA 

 Electrostatic Chuck & Its Repair Method

 Registeration

ZL 2017 1 0****** 

CHINA 


R&D Equipment, Facility

 ULTRASONIC TEST SYSTEM
   Facility that check defect of CERAMIC PLATE or condition of bonding





 ROUGHNESS MEASURING INSTRUMENT
   Measuremnet of suface roughness and shape









 HEATING TEST SYSTEM
   Equipment for inspecting the thermal shape that contains the heater ESC





 ESC TEST MACHINE
   Equipment for testing the performance of the ESC in the similar conditions 
   with semicondutor manufacturing facility